Faculty

Institution

Unit

Venue

John F. Conley, Jr.

Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science

Oregon State University

Affiliations

College of Engineering

School of Electrical Engineering and Computer Science

John F. Conley, Jr. is currently serving as a College Of Engineering Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science at Oregon State University.

Honors

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Experiences

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Education

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John F. Conley, Jr.

Oregon State University

Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science

You can click a keyword to filter the displayed items

materials science applied physics thin films electronic materials semiconductors electrical engineering electronics solid-state electronics surface science microelectronics oxide electronics nanotechnology materials engineering semiconductor devices chemical deposition atomic layer deposition condensed matter physics chemical vapor deposition chemical engineering semiconductor materials interface science semiconductor technology thin film processing optoelectronics metals thin film process technology nuclear science semiconductor device fabrication material chemistry semiconductor nanostructures microelectronics reliability nanostructure synthesis atomic layer nanoparticle research tunneling microscopy sensor design predictive model additive manufacturing nuclear engineering surface modification charge transport power electronics vacuum device solid-state chemistry carbon-based materials compound semiconductors mechanical science surface functionalization sensor technology nanobiotechnology zno nanobridge devices implanted oxygen oxides deep electron trap preliminary investigation advanced energy material controlled release nuclear materials composite science organic electronics surface nanotechnology surface chemistry flexible sensor radiation response hafnium oxide electron spin resonance bipolar resistive switching degradation mechanisms nanometrology surface reactivity layered materials device integration charge carrier transport trapped electron centers atomic-layer-deposited hafnium oxide mim electronics amorphous metal electrodes health engineering nanomaterials internal photoemission spectroscopy material research

Notable Scholarly Works

Notable Federal Grants

Collaborators

Atomic Layer Deposition of Entropy Stabilized Zr2Ta2O9 and Light Activated Self-Rectifying Resistive Switching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025)

atomic layer depositionmaterials sciencesemiconductorssemiconductor materialscompound semiconductorsmaterial researchapplied physicsadvanced functional materialsself-rectifying resistive switchingthin filmsoxide electronicsmaterial chemistryelectronic materials

4× 25 Gb/S On-Chip Wdm Cascaded With Moscap-Driven Silicon Microring Modulators. (2024)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyAlan X. Wang

electronicscomputer engineeringmicroelectronicssemiconductorsintegrated circuitsvlsi designelectrical engineering

Nonvolatile Memory Cells From Hafnium Zirconium Oxide Ferroelectric Tunnel Junctions Using Nb and Nbn Electrodes. Journal of Applied Physics (2024)

Jessica Haglund-PetersonBenjamin L. AronsonSamantha T. JaszewskiScott HabermehlGiovanni EstevesJohn F. ConleyJon F. IhlefeldM. David Henry

semiconductor technologymaterials sciencenanotechnologypower electronicsoptoelectronicsnonvolatile memory cellsapplied physicsmicroelectronicshafnium zirconiumnbn electrodeselectrical engineeringelectronic materials

Sub-Volt High-Speed Silicon Moscap Microring Modulator Driven by High-Mobility Conductive Oxide. Nature Communications (2024)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyHaisheng RongRanjeet KumarAlan X. Wang

optoelectronicsmicroelectronicspower electronicselectronicsmicro-electromechanical systemssolid-state electronicsoxide electronicselectrical engineeringsemiconductor technologymaterials sciencehigh-mobility conductive oxidephotovoltaicssemiconductorsmicrowave technologyelectronic materialsengineeringmaterials engineeringmicro technologysemiconductor devices

On-Chip Wavelength Division Multiplexing Filters Using Extremely Efficient Gate-Driven Silicon Microring Resonator Array. Scientific Reports (2023)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyAlan X. Wang

scientific dataoptoelectronicsscientific computingmicrofabricationphotonicsmicroelectronicsoptical engineeringsemiconductorsfilter designresonator arraybiological engineering

Mos Capacitor Driven Silicon Microring Resonator With Large Wavelength Tunability. Conference on Lasers and Electro-Optics (2022)

Wei-Che HsuBenjamin KuppCade TrotterNabila NujhatJohn F. ConleyAlan X. Wang

materials sciencelaser scienceoptoelectronicsmos capacitorphotonicsapplied physicsmicroelectronicsmicro-electromechanical systemslarge wavelength tunabilityelectro-optics deviceelectrical engineering

Plasma-Enhanced Atomic Layer Deposition of Wo3-Sio2 Films Using a Heteronuclear Precursor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kamesh MullapudiKonner E. K. HoldenJessica L. PetersonCharles L. DezelahDaniel F. MoserRavindra K. KanjoliaDouglas J. TweetJohn F. Conley

chemical vapor depositionapplied physicsthin filmssurface scienceinterface science

Slotted Silicon Microring Resonator Gated by Transparent Conducting Oxide Capacitor. Conference on Lasers and Electro-Optics (2022)

WC HsuB KuppC TrotterN NujhatJF ConleyAX Wang

semiconductor technologylaser scienceoptoelectronicsapplied physicssemiconductorselectrical engineering

Ultraviolet Photo-Enhanced Atomic Layer Deposition for Improving Dielectric Properties of Low Temperature Deposited Al2o3. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Konner E. K. HoldenShane M. WitsellPaul C. LemaireJohn F. Conley

materials sciencedielectric propertiesthin film processingthin filmssurface scienceinterface science

Determination of Hafnium Zirconium Oxide Interfacial Band Alignments Using Internal Photoemission Spectroscopy and X-Ray Photoelectron Spectroscopy. ACS Applied Materials & Interfaces (2021)

Melanie A. JenkinsKonner E. K. HoldenSean W. SmithMichael T. BrumbachM. David HenryConan WeilandJoseph C. WoicikSamantha T. JaszewskiJon F. IhlefeldJohn F. Conley

characterization (materials science)materials sciencematerial analysisthin filmsx-ray photoelectron spectroscopyinternal photoemissionelectroceramicsmicroelectronicsapplied physicssemiconductorsferroelectric applicationoxide electronicsadvanced dielectrichafnium zirconium oxideelectronic materials

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John F. Conley, Jr.

Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science

Oregon State University

Affiliations

College of Engineering

School of Electrical Engineering and Computer Science

John F. Conley, Jr. is currently serving as a College Of Engineering Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science at Oregon State University.

Honors

Create free account to unlock more features

Experiences

Create free account to unlock more features

Education

Create free account to unlock more features

John F. Conley, Jr.

Oregon State University

Professor Professor of Electrical Engineering and Computer Science EECS and of Materials Science

You can click a keyword to filter the displayed items

Notable Scholarly Works

Notable Federal Grants

Collaborators

Atomic Layer Deposition of Entropy Stabilized Zr2Ta2O9 and Light Activated Self-Rectifying Resistive Switching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025)

4× 25 Gb/S On-Chip Wdm Cascaded With Moscap-Driven Silicon Microring Modulators. (2024)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyAlan X. Wang

electronicscomputer engineeringmicroelectronicssemiconductorsintegrated circuitsvlsi designelectrical engineering

Nonvolatile Memory Cells From Hafnium Zirconium Oxide Ferroelectric Tunnel Junctions Using Nb and Nbn Electrodes. Journal of Applied Physics (2024)

Jessica Haglund-PetersonBenjamin L. AronsonSamantha T. JaszewskiScott HabermehlGiovanni EstevesJohn F. ConleyJon F. IhlefeldM. David Henry

Sub-Volt High-Speed Silicon Moscap Microring Modulator Driven by High-Mobility Conductive Oxide. Nature Communications (2024)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyHaisheng RongRanjeet KumarAlan X. Wang

On-Chip Wavelength Division Multiplexing Filters Using Extremely Efficient Gate-Driven Silicon Microring Resonator Array. Scientific Reports (2023)

Wei-Che HsuNabila NujhatBenjamin KuppJohn F. ConleyAlan X. Wang

scientific dataoptoelectronicsscientific computingmicrofabricationphotonicsmicroelectronicsoptical engineeringsemiconductorsfilter designresonator arraybiological engineering

Mos Capacitor Driven Silicon Microring Resonator With Large Wavelength Tunability. Conference on Lasers and Electro-Optics (2022)

Wei-Che HsuBenjamin KuppCade TrotterNabila NujhatJohn F. ConleyAlan X. Wang

materials sciencelaser scienceoptoelectronicsmos capacitorphotonicsapplied physicsmicroelectronicsmicro-electromechanical systemslarge wavelength tunabilityelectro-optics deviceelectrical engineering

Plasma-Enhanced Atomic Layer Deposition of Wo3-Sio2 Films Using a Heteronuclear Precursor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kamesh MullapudiKonner E. K. HoldenJessica L. PetersonCharles L. DezelahDaniel F. MoserRavindra K. KanjoliaDouglas J. TweetJohn F. Conley

chemical vapor depositionapplied physicsthin filmssurface scienceinterface science

Slotted Silicon Microring Resonator Gated by Transparent Conducting Oxide Capacitor. Conference on Lasers and Electro-Optics (2022)

WC HsuB KuppC TrotterN NujhatJF ConleyAX Wang

semiconductor technologylaser scienceoptoelectronicsapplied physicssemiconductorselectrical engineering

Ultraviolet Photo-Enhanced Atomic Layer Deposition for Improving Dielectric Properties of Low Temperature Deposited Al2o3. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Konner E. K. HoldenShane M. WitsellPaul C. LemaireJohn F. Conley

materials sciencedielectric propertiesthin film processingthin filmssurface scienceinterface science

Determination of Hafnium Zirconium Oxide Interfacial Band Alignments Using Internal Photoemission Spectroscopy and X-Ray Photoelectron Spectroscopy. ACS Applied Materials & Interfaces (2021)

Melanie A. JenkinsKonner E. K. HoldenSean W. SmithMichael T. BrumbachM. David HenryConan WeilandJoseph C. WoicikSamantha T. JaszewskiJon F. IhlefeldJohn F. Conley

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