Faculty

Institution

Unit

Venue

Gottlieb S. Oehrlein

Professor MSE Professor

University of Maryland, College Park

Affiliations

A. James Clark School of Engineering

Materials Science and Engineering

Gottlieb S. Oehrlein is currently serving as an A. James Clark School Of Engineering Professor MSE Professor at University of Maryland, College Park.

Honors

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Experiences

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Education

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Gottlieb S. Oehrlein

University of Maryland, College Park

Professor MSE Professor

You can click a keyword to filter the displayed items

materials science applied physics surface science materials engineering plasma etching plasma processing mechanical engineering thin films nanotechnology chemical engineering semiconductors electronic materials microelectronics plasma science polymer science vacuum device surface processing plasma chemistry thin film processing microfabrication surface nanotechnology surface engineering additive manufacturing solid-state electronics surface modification surface chemistry surface characterization material chemistry electronics material research semiconductor technology reactive ion etching defect formation silicon dioxide condensed matter polymer technology interface science electrochemical interfaces applied chemistry surface electrochemistry thermal engineering mechanical science gas discharge plasma electrochemical process photoluminescence atomic layer etching microwave technology surface reactivity plasma applications plasma electronics fluorocarbon plasmas polymer engineering surface analysis silicon nitride plasma-surface interactions ion implantation glow discharges semiconductor devices semiconductor materials sige alloys semiconductor nanostructures silicon surfaces selective etching molecular dynamics simulations atmospheric pressure polymer degradation nanoscale science material processing polycrystalline silicon ion bombardment surface processes polymer surface modifications photoresist degradation membrane science raman spectroscopy nanoparticle research

Notable Scholarly Works

Notable Federal Grants

Collaborators

Investigation of N 2 /O 2 Plasma Interaction With Pt-Catalyst: Effect of Metastable Adsorbates on Product Hysteresis. Journal of Physics D Applied Physics (2025)

Investigation of Ruthenium Etching Induced by Electron Beam Irradiation and O2/Cl2 Remote Plasma-Based Neutral Fluxes: Mechanistic Insights and Etching Model. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025)

Selective Etching of Ruthenium Using Electron Beam-Irradiation and Ar/O2/Cf4 Remote Plasma-Based Surface Functionalization: Comparisons to Tantalum. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2025)

Yudong LiHubertus MarbachChristian PreischlMichael BudachDaniel RhinowKlaus EdingerGottlieb S. Oehrlein

surface sciencesurface modificationsurface processingsurface functionalizationselective etchingchemical engineering

CORRIGENDUM: Plasma Catalysis: Separating Plasma and Surface Contributions for an Ar/N 2 /O 2 Atmospheric Discharge Interacting With a Pt Catalyst (2023 Plasma Sources Sci. Technol. 32 125001). Plasma Sources Science and Technology (2024)

Michael HinshelwoodGottlieb S Oehrlein

plasma catalysispt catalystapplied physicssurface contributions

Future of Plasma Etching for Microelectronics: Challenges and Opportunities. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024)

Gottlieb S. OehrleinStephan M. BrandstadterRobert L. BruceJane P. ChangJessica C. DeMottVincent M. DonnellyRémi DussartAndreas FischerRichard A. GottschoSatoshi HamaguchiMasanobu HondaMasaru HoriKenji IshikawaSteven G. JaloviarKeren J. KanarikKazuhiro KarahashiAkiteru KoHiten KothariNobuyuki KuboiMark J. KushnerThorsten LillPingshan LuanAli MesbahEric MillerShoubhanik NathYoshinobu OhyaMitsuhiro OmuraChanhoon ParkJohn PouloseShahid RaufMakoto SekineTaylor G. SmithNathan StaffordTheo StandaertPeter L. G. Ventzek

additive manufacturingmicroelectronicsmaterials scienceapplied physicsplasma etchingnanotechnologymechanical engineering

Exploring Oxide-Nitride-Oxide Scalloping Behavior With Small Gap Structure and Chemical Analysis After Fluorocarbon or Hydrofluorocarbon Plasma Processing. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2023)

Sang-Jin ChungPingshan LuanMinjoon ParkAndrew MetzGottlieb S. Oehrlein

hydrofluorocarbon plasma processingsmall gap structuremicroelectronicsmaterials scienceapplied physicsplasma processingnanotechnology

Plasma Catalysis: Separating Plasma and Surface Contributions for an Ar/N 2 /O 2 Atmospheric Discharge Interacting With a Pt Catalyst. Plasma Sources Science and Technology (2023)

Michael HinshelwoodGottlieb S Oehrlein

surface scienceplasma catalysissurface contributionspt catalystapplied physics

Electron Beam-Induced Etching of Sio2, Si3N4, and Poly-Si Assisted by Cf4/O2 Remote Plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kang-Yi LinChristian PreischlChristian Felix HermannsDaniel RhinowHans-Michael SolowanMichael BudachHubertus MarbachKlaus EdingerG. S. Oehrlein

surface sciencematerials scienceapplied physicsplasma etchingplasma processing

Sio2 Etching and Surface Evolution Using Combined Exposure to Cf4/O2 Remote Plasma and Electron Beam. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kang-Yi LinChristian PreischlChristian Felix HermannsDaniel RhinowHans-Michael SolowanMichael BudachKlaus EdingerG. S. Oehrlein

surface scienceelectron beamcombined exposuresurface evolutionmaterials scienceapplied physicsplasma etchingplasma science

The 2022 Plasma Roadmap: Low Temperature Plasma Science and Technology. Journal of Physics D Applied Physics (2022)

I AdamovichS AgarwalE AhedoL L AlvesS BaalrudN BabaevaA BogaertsA BourdonP J BruggemanC CanalE H ChoiS CoulombeZ DonkóD B GravesS HamaguchiD HegemannM HoriH-H KimG M W KroesenM J KushnerA LaricchiutaX LiT E MaginS Mededovic ThagardV MillerA B MurphyG S OehrleinN PuacR M SankaranS SamukawaM ShirataniM ŠimekN TarasenkoK TerashimaE Thomas JrJ TrieschmannS TsikataM M TurnerI J van der WaltM C M van de SandenT von Woedtke

applied physicsplasma scienceplasma roadmap

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Gottlieb S. Oehrlein

Professor MSE Professor

University of Maryland, College Park

Affiliations

A. James Clark School of Engineering

Materials Science and Engineering

Gottlieb S. Oehrlein is currently serving as an A. James Clark School Of Engineering Professor MSE Professor at University of Maryland, College Park.

Honors

Create free account to unlock more features

Experiences

Create free account to unlock more features

Education

Create free account to unlock more features

Gottlieb S. Oehrlein

University of Maryland, College Park

Professor MSE Professor

You can click a keyword to filter the displayed items

Notable Scholarly Works

Notable Federal Grants

Collaborators

Investigation of N 2 /O 2 Plasma Interaction With Pt-Catalyst: Effect of Metastable Adsorbates on Product Hysteresis. Journal of Physics D Applied Physics (2025)

Yudong LiHubertus MarbachChristian PreischlMichael BudachDaniel RhinowKlaus EdingerGottlieb S. Oehrlein

surface sciencesurface modificationsurface processingsurface functionalizationselective etchingchemical engineering

Michael HinshelwoodGottlieb S Oehrlein

plasma catalysispt catalystapplied physicssurface contributions

additive manufacturingmicroelectronicsmaterials scienceapplied physicsplasma etchingnanotechnologymechanical engineering

Sang-Jin ChungPingshan LuanMinjoon ParkAndrew MetzGottlieb S. Oehrlein

hydrofluorocarbon plasma processingsmall gap structuremicroelectronicsmaterials scienceapplied physicsplasma processingnanotechnology

Plasma Catalysis: Separating Plasma and Surface Contributions for an Ar/N 2 /O 2 Atmospheric Discharge Interacting With a Pt Catalyst. Plasma Sources Science and Technology (2023)

Michael HinshelwoodGottlieb S Oehrlein

surface scienceplasma catalysissurface contributionspt catalystapplied physics

Electron Beam-Induced Etching of Sio2, Si3N4, and Poly-Si Assisted by Cf4/O2 Remote Plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kang-Yi LinChristian PreischlChristian Felix HermannsDaniel RhinowHans-Michael SolowanMichael BudachHubertus MarbachKlaus EdingerG. S. Oehrlein

surface sciencematerials scienceapplied physicsplasma etchingplasma processing

Sio2 Etching and Surface Evolution Using Combined Exposure to Cf4/O2 Remote Plasma and Electron Beam. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Kang-Yi LinChristian PreischlChristian Felix HermannsDaniel RhinowHans-Michael SolowanMichael BudachKlaus EdingerG. S. Oehrlein

surface scienceelectron beamcombined exposuresurface evolutionmaterials scienceapplied physicsplasma etchingplasma science

The 2022 Plasma Roadmap: Low Temperature Plasma Science and Technology. Journal of Physics D Applied Physics (2022)

applied physicsplasma scienceplasma roadmap

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2
3
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5
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10 / page

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