Faculty

Institution

Unit

Venue

John Ekerdt

Professor Emeritus

University of Texas at Austin

Affiliations

Cockrell School of Engineering

Mcketta Department of Chemical Engineering

John Ekerdt is currently serving as a Cockrell School Of Engineering Professor Emeritus at University of Texas At Austin.

Honors

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Experiences

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Education

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John Ekerdt

University of Texas at Austin

Professor Emeritus

You can click a keyword to filter the displayed items

materials science applied physics surface science thin films materials engineering nanotechnology electronic materials chemical engineering material chemistry condensed matter physics advanced materials mechanical engineering surface chemistry inorganic chemistry solid-state electronics atomic layer deposition microelectronics material research electronics surface nanotechnology semiconductor technology epitaxial growth additive manufacturing thin film processing surface characterization chemical vapor deposition interface science crystal growth semiconductor devices condensed matter semiconductor nanostructures transition metal chemistry nanoparticle research fabrication techniques vacuum device surface analysis semiconductor materials layered materials surface engineering optical engineering flash imprint lithography surface reactivity surface modification catalytic process coordination chemistry solid-state chemistry industrial catalysis semiconductor device fabrication metals catalyst preparation adsorption structural chemistry membrane science molecular catalysis printed electronics organometallic catalysis monolithic integration chemical sciences advanced electrode material silicon dioxide material preparation infrared spectroscopy catalytic materials nanolithography method single-source precursors silicon nanoparticles lignin model compounds imprint lithography vacuum ultraviolet zirconium dioxide acidic ionic liquid ionic liquid area-selective deposition selective etching epitaxial integration thiophene hydrodesulfurization thin film process technology nanoengineering surface nanoengineering chemical deposition metal oxide thin films nanomaterials nanostructure synthesis nano energy

Video Presentations

Notable Scholarly Works

Notable Federal Grants

Collaborators

Area-Selective Atomic Layer Deposition of Palladium. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024)

Himamshu C. NallanXin YangBrennan M. CoffeyAndrei DolocanJohn G. Ekerdt

vacuum deviceadditive manufacturingsurface sciencecoatingsapplied physicsthin filmsmaterials science

Ammonium Chloride (–Nh3+CL-) Salt Formation From Dichlorosilane Decomposition and Its Potential Impact on Silicon Nitride Atomic Layer Deposition. Applied Surface Science (2023)

Tsung-Hsuan YangErik S. ChengSamuel M. JohnsonToshihiko IwaoJianping ZhaoJohn G. EkerdtPeter L. G. VentzekGyeong S. Hwang

additive manufacturingsurface treatmentschemical engineeringsurface sciencesurface chemistrysurface processingdichlorosilane decompositionammonium chlorideapplied physicssurface engineeringmaterials sciencesurface modeling

Area Selective Atomic Layer Deposition of Sno2 as an Etch Resist in Fluorine Based Processes. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023)

Xin YangHimamshu NallanBrennan M. CoffeyJohn G. Ekerdt

materials engineeringchemical engineeringsurface sciencenanotechnologyetch resistapplied physicsthin filmsmaterials science

Characterization of Neutral Species in an Nh3-Ar Plasma Generated by a Capacitively Coupled Plasma Source at Various Radio Frequencies. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023)

S. M. JohnsonJ. P. ZhaoC. SchlechteJ. CarrollT. IwaoP. L. G. VentzekJ. G. Ekerdt

surface scienceneutral speciesmaterials science

Post-Annealing Optimization of the Heteroepitaxial La-Doped Srsno 3 Integrated on Silicon via Ald. Nanoscale (2023)

Yu ZhangShen HuPei-Yu ChenJiyuan ZhuBojia ChenRongxu BaiHao ZhuLin ChenDavid W. ZhangJack C. LeeQingqing SunJohn G. EkerdtLi Ji

nanomaterialspost-annealing optimizationsolid-state electronicsadvanced materialssurface sciencecondensed mattersemiconductor nanostructuresnanotechnologymaterial researchnanoscale chemistrysemiconductor technologynanoscale modelingelectronic materialsnanoscale sciencesemiconductorsnanoparticle researchmaterials science

Contributions of Bulk and Surface Energies in Stabilizing Metastable Polymorphs: A Comparative Study of Group 3 Sesquioxides La 2 O 3, Ga 2 O 3, and in 2 O 3. Physical Review Materials (2022)

Fatima Al-QuaitiP.-Y. ChenJ. G. EkerdtA. A. Demkov

inorganic chemistrybenchmark studiescomparative studyphysicssurface sciencemetastable polymorphscanadian studiesapplied physicsthin filmsmaterials science

Low Temperature, Area-Selective Atomic Layer Deposition of Nio and Ni. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Himamshu C. NallanXin YangBrennan M. CoffeyJohn G. Ekerdt

vacuum devicelow temperaturematerials engineeringsurface sciencesurface nanotechnologyapplied physicsthin filmsmaterials science

Anodized Nickel Foam for Oxygen Evolution Reaction in Fe-Free and Unpurified Alkaline Electrolytes at High Current Densities. ACS Nano (2021)

Yoon Jun SonKenta KawashimaBryan R. WygantChon Hei LamJames N. BurrowHugo CelioAndrei DolocanJohn G. EkerdtC. Buddie Mullins

nanomaterialsnickel foammaterials engineeringanodizinghigh current densitieschemical engineeringoxygen evolution reactionnanotechnologynanoengineeringfunctional nanomaterialsmaterials scienceelectrochemistry

Atomic Layer Deposition and Selective Etching of Ruthenium for Area-Selective Deposition: Temperature Dependence and Supercycle Design. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2021)

Martijn F. J. VosSonali N. ChopraJohn G. EkerdtSumit AgarwalWilhelmus M. M. (Erwin) KesselsAdriaan J. M. Mackus

additive manufacturingtemperature dependenceatomic layer depositionsurface sciencesupercycle designarea-selective depositionapplied physicsselective etchingmaterials science

Electro-Optic Response in Epitaxially Stabilized Orthorhombic M M 2 Bati O 3. Physical Review Materials (2021)

Marc ReynaudPei-Yu ChenWente LiTherese PaolettaSunah KwonDae Hun LeeIlya BeskinAgham B. PosadasMoon J. KimChad M. LandisKeji LaiJohn G. EkerdtAlexander A. Demkov

material propertiessolid-state electronicsmaterial performanceadvanced materialssurface sciencecondensed mattermaterial researchcharge separationoptoelectronicselectronic materialselectrical engineeringelectro-optic responseepitaxial growthfunctional materialsapplied physicsthin filmshigh-performance materialsmaterials science

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John Ekerdt

Professor Emeritus

University of Texas at Austin

Affiliations

Cockrell School of Engineering

Mcketta Department of Chemical Engineering

John Ekerdt is currently serving as a Cockrell School Of Engineering Professor Emeritus at University of Texas At Austin.

Honors

Create free account to unlock more features

Experiences

Create free account to unlock more features

Education

Create free account to unlock more features

John Ekerdt

University of Texas at Austin

Professor Emeritus

You can click a keyword to filter the displayed items

Video Presentations

Notable Scholarly Works

Notable Federal Grants

Collaborators

Area-Selective Atomic Layer Deposition of Palladium. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024)

Himamshu C. NallanXin YangBrennan M. CoffeyAndrei DolocanJohn G. Ekerdt

vacuum deviceadditive manufacturingsurface sciencecoatingsapplied physicsthin filmsmaterials science

Ammonium Chloride (–Nh3+CL-) Salt Formation From Dichlorosilane Decomposition and Its Potential Impact on Silicon Nitride Atomic Layer Deposition. Applied Surface Science (2023)

Tsung-Hsuan YangErik S. ChengSamuel M. JohnsonToshihiko IwaoJianping ZhaoJohn G. EkerdtPeter L. G. VentzekGyeong S. Hwang

Area Selective Atomic Layer Deposition of Sno2 as an Etch Resist in Fluorine Based Processes. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023)

Xin YangHimamshu NallanBrennan M. CoffeyJohn G. Ekerdt

materials engineeringchemical engineeringsurface sciencenanotechnologyetch resistapplied physicsthin filmsmaterials science

S. M. JohnsonJ. P. ZhaoC. SchlechteJ. CarrollT. IwaoP. L. G. VentzekJ. G. Ekerdt

surface scienceneutral speciesmaterials science

Post-Annealing Optimization of the Heteroepitaxial La-Doped Srsno 3 Integrated on Silicon via Ald. Nanoscale (2023)

Yu ZhangShen HuPei-Yu ChenJiyuan ZhuBojia ChenRongxu BaiHao ZhuLin ChenDavid W. ZhangJack C. LeeQingqing SunJohn G. EkerdtLi Ji

Contributions of Bulk and Surface Energies in Stabilizing Metastable Polymorphs: A Comparative Study of Group 3 Sesquioxides La 2 O 3, Ga 2 O 3, and in 2 O 3. Physical Review Materials (2022)

Fatima Al-QuaitiP.-Y. ChenJ. G. EkerdtA. A. Demkov

inorganic chemistrybenchmark studiescomparative studyphysicssurface sciencemetastable polymorphscanadian studiesapplied physicsthin filmsmaterials science

Low Temperature, Area-Selective Atomic Layer Deposition of Nio and Ni. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2022)

Himamshu C. NallanXin YangBrennan M. CoffeyJohn G. Ekerdt

vacuum devicelow temperaturematerials engineeringsurface sciencesurface nanotechnologyapplied physicsthin filmsmaterials science

Anodized Nickel Foam for Oxygen Evolution Reaction in Fe-Free and Unpurified Alkaline Electrolytes at High Current Densities. ACS Nano (2021)

Yoon Jun SonKenta KawashimaBryan R. WygantChon Hei LamJames N. BurrowHugo CelioAndrei DolocanJohn G. EkerdtC. Buddie Mullins

Martijn F. J. VosSonali N. ChopraJohn G. EkerdtSumit AgarwalWilhelmus M. M. (Erwin) KesselsAdriaan J. M. Mackus

additive manufacturingtemperature dependenceatomic layer depositionsurface sciencesupercycle designarea-selective depositionapplied physicsselective etchingmaterials science

Electro-Optic Response in Epitaxially Stabilized Orthorhombic M M 2 Bati O 3. Physical Review Materials (2021)

Marc ReynaudPei-Yu ChenWente LiTherese PaolettaSunah KwonDae Hun LeeIlya BeskinAgham B. PosadasMoon J. KimChad M. LandisKeji LaiJohn G. EkerdtAlexander A. Demkov

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