Faculty

Institution

Unit

Venue

Robert Wallace

Professor

University of Texas at Dallas

Affiliations

Erik Jonsson School of Engineering and Computer Science

Electrical and Computer Engineering

Materials Science and Engineering

Mechanical Engineering

School of Natural Sciences and Mathematics

Physics

Robert Wallace is currently serving as an Electrical And Computer Engineering Professor at University of Texas At Dallas.

Honors

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Experiences

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Education

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Robert Wallace

University of Texas at Dallas

Professor

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materials science applied physics electronic materials thin films surface science electrical engineering semiconductors electronics solid-state electronics optoelectronics materials engineering nanotechnology engineering condensed matter physics advanced materials semiconductor technology interface science semiconductor devices oxide electronics material research condensed matter semiconductor materials material chemistry surface characterization layered materials semiconductor nanostructures atomic layer deposition advanced functional materials surface chemistry crystal growth advanced dielectric additive manufacturing semiconductor device fabrication compound semiconductors surface engineering surface analysis interface chemistry aluminum gallium nitride surface nanotechnology vacuum device thin film processing metals nanometrology surface processing carbon power electronics chemical vapor deposition transition metal chalcogenides epitaxial growth organic electronics nanoparticle research carbon-based materials molecular beam epitaxy solid-state chemistry thermal stability graphene nanoribbons electrochemical interfaces surface reactivity thermal engineering high-k dielectrics chemical deposition graphene nanomeshes first-principles study nanoscale science electrical characterization electronic properties fermi level first principles atomic layer systematic study in-situ studies transition metal dichalcogenides interfacial chemistry border traps interface states surface oxidation semiconductor material integration issues gate dielectrics interface (matter) nanoelectronics

Video Presentations

Notable Scholarly Works

Notable Federal Grants

Collaborators

Correction to “Mechanism of Fermi Level Pinning for Metal Contacts on Molybdenum Dichalcogenide”. ACS Applied Materials & Interfaces (2024)

Xinglu WangYaoqiao HuSeong Yeoul KimKyeongjae ChoRobert M. Wallace

materials sciencemolybdenum dichalcogenideinterface sciencesurface sciencematerial researchinterface (matter)metal contactsadvanced materialsfermi levelapplied physicssurface tension

Fundamental Understanding of Interface Chemistry and Electrical Contact Properties of Bi and Mos 2. ACS Applied Materials & Interfaces (2024)

Seong Yeoul KimZheng SunJoy RoyXinglu WangZhihong ChenJoerg AppenzellerRobert M. Wallace

materials sciencematerial chemistryinterface sciencesurface scienceinterface (matter)interface chemistryinterfacial studieselectrical contact properties

Interface Chemistry, Band Alignment, and Thermal Stability Study of Sn Metal Contact on Bulk and Monolayer Mos2. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2024)

Joy RoySeong Yeoul KimRobert M. Wallace

materials scienceinterface scienceinterface chemistrymicroelectronicsthermal stability studynanotechnologyband alignment

Large-Area Intercalated Two-Dimensional Pb/Graphene Heterostructure as a Platform for Generating Spin–Orbit Torque. ACS Nano (2024)

Alexander VeraBoyang ZhengWilson YanezKaijie YangSeong Yeoul KimXinglu WangJimmy C. KotsakidisHesham El-SherifGopi KrishnanRoland J. KochT. Andrew BowenChengye DongYuanxi WangMaxwell WetheringtonEli RotenbergNabil BassimAdam L. FriedmanRobert M. WallaceChaoxing LiuNitin SamarthVincent H. CrespiJoshua A. Robinson

materials sciencespintronicsspin-orbit torquequantum heterostructuresnanomaterialsgraphenenanotechnologynanostructure synthesis

Low Contact Resistance on Monolayer Mos 2 Field-Effect Transistors Achieved by Cmos-Compatible Metal Contacts. ACS Nano (2024)

Zheng SunSeong Yeoul KimJun CaiJianan ShenHao-Yu LanYuanqiu TanXinglu WangChao ShenHaiyan WangZhihong ChenRobert M. WallaceJoerg Appenzeller

metalsmxeneselectronic materialschemical engineeringoxide electronicssolid-state electronicsmicroelectronicsmechanical engineeringdefect tolerancenanoelectronicsnanosensorselectronicsflexible electronicsmicrowave technologycmos-compatible metal contactssurface scienceelectrical engineeringnovel interfacemolecular electronicslow contact resistance

Mechanism of Fermi Level Pinning for Metal Contacts on Molybdenum Dichalcogenide. ACS applied materials & interfaces (2024)

Xinglu WangYaoqiao HuSeong Yeoul KimKyeongjae ChoRobert M. Wallace

materials sciencemolybdenum dichalcogenidemechanical engineeringmaterials engineeringmetal contactsadvanced materialsapplied physics

Impact of Process Anneals on High-K/β-Ga2O3 Interfaces and Capacitance. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023)

Roberta HawkinsXinglu WangNaim MoumenRobert M. WallaceChadwin D. Young

materials scienceinterface sciencesurface scienceelectronic materialsvacuum deviceprocess annealsapplied physicsengineering

Origins of Fermi Level Pinning for Ni and Ag Metal Contacts on Tungsten Dichalcogenides. ACS Nano (2023)

Xinglu WangYaoqiao HuSeong Yeoul KimRafik AddouKyeongjae ChoRobert M. Wallace

thin filmsmaterials sciencesemiconductor nanostructurestungsten dichalcogenideselectronic materialsmechanical engineeringnanosensorssolid-state electronicselectronicsag metal contactsfunctional nanomaterialsfermi levelnanomaterialsapplied physicsnanotechnologyoptoelectronicsnanometrologynanoengineering

In Situ Isotope Study of Indium Diffusion in Inp/Al2O3 Stacks. Applied Physics Letters (2022)

Ze FengXiaoye QinXiao ChenZhiyun LiRong HuangYang ShenDing DingYitong WangMeiyi JingYi CuiAn DingsunHui LiuHong DongRobert M. Wallace

thin filmsmaterials scienceindium out-diffusioninterface scienceelectronic materialsmaterial researchsemiconductor materialsoxide electronicsinterface (matter)solid-state electronicssemiconductorsmicroelectronicsapplied physicssemiconductor technologycharacterization (materials science)advanced dielectricelectronicsindium atomssurface scienceindium diffusionelectrical engineering

Controlling the Pd Metal Contact Polarity to Trigonal Tellurium by Atomic Hydrogen‐Removal of the Native Tellurium Oxide. Advanced Materials Interfaces (2021)

Christopher M. SmythGuanyu ZhouAdam T. BartonRobert M. WallaceChristopher L. Hinkle

materials scienceinterface sciencetrigonal telluriummechanical engineeringmaterials engineeringatomic hydrogen-removaladvanced materialsnative tellurium oxideapplied physics

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Robert Wallace

Professor

University of Texas at Dallas

Affiliations

Erik Jonsson School of Engineering and Computer Science

Electrical and Computer Engineering

Materials Science and Engineering

Mechanical Engineering

School of Natural Sciences and Mathematics

Physics

Robert Wallace is currently serving as an Electrical And Computer Engineering Professor at University of Texas At Dallas.

Honors

Create free account to unlock more features

Experiences

Create free account to unlock more features

Education

Create free account to unlock more features

Robert Wallace

University of Texas at Dallas

Professor

You can click a keyword to filter the displayed items

Video Presentations

Notable Scholarly Works

Notable Federal Grants

Collaborators

Correction to “Mechanism of Fermi Level Pinning for Metal Contacts on Molybdenum Dichalcogenide”. ACS Applied Materials & Interfaces (2024)

Xinglu WangYaoqiao HuSeong Yeoul KimKyeongjae ChoRobert M. Wallace

materials sciencemolybdenum dichalcogenideinterface sciencesurface sciencematerial researchinterface (matter)metal contactsadvanced materialsfermi levelapplied physicssurface tension

Fundamental Understanding of Interface Chemistry and Electrical Contact Properties of Bi and Mos 2. ACS Applied Materials & Interfaces (2024)

Seong Yeoul KimZheng SunJoy RoyXinglu WangZhihong ChenJoerg AppenzellerRobert M. Wallace

materials sciencematerial chemistryinterface sciencesurface scienceinterface (matter)interface chemistryinterfacial studieselectrical contact properties

Joy RoySeong Yeoul KimRobert M. Wallace

materials scienceinterface scienceinterface chemistrymicroelectronicsthermal stability studynanotechnologyband alignment

Large-Area Intercalated Two-Dimensional Pb/Graphene Heterostructure as a Platform for Generating Spin–Orbit Torque. ACS Nano (2024)

materials sciencespintronicsspin-orbit torquequantum heterostructuresnanomaterialsgraphenenanotechnologynanostructure synthesis

Low Contact Resistance on Monolayer Mos 2 Field-Effect Transistors Achieved by Cmos-Compatible Metal Contacts. ACS Nano (2024)

Zheng SunSeong Yeoul KimJun CaiJianan ShenHao-Yu LanYuanqiu TanXinglu WangChao ShenHaiyan WangZhihong ChenRobert M. WallaceJoerg Appenzeller

Mechanism of Fermi Level Pinning for Metal Contacts on Molybdenum Dichalcogenide. ACS applied materials & interfaces (2024)

Xinglu WangYaoqiao HuSeong Yeoul KimKyeongjae ChoRobert M. Wallace

materials sciencemolybdenum dichalcogenidemechanical engineeringmaterials engineeringmetal contactsadvanced materialsapplied physics

Impact of Process Anneals on High-K/β-Ga2O3 Interfaces and Capacitance. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023)

Roberta HawkinsXinglu WangNaim MoumenRobert M. WallaceChadwin D. Young

materials scienceinterface sciencesurface scienceelectronic materialsvacuum deviceprocess annealsapplied physicsengineering

Origins of Fermi Level Pinning for Ni and Ag Metal Contacts on Tungsten Dichalcogenides. ACS Nano (2023)

Xinglu WangYaoqiao HuSeong Yeoul KimRafik AddouKyeongjae ChoRobert M. Wallace

In Situ Isotope Study of Indium Diffusion in Inp/Al2O3 Stacks. Applied Physics Letters (2022)

Ze FengXiaoye QinXiao ChenZhiyun LiRong HuangYang ShenDing DingYitong WangMeiyi JingYi CuiAn DingsunHui LiuHong DongRobert M. Wallace

Controlling the Pd Metal Contact Polarity to Trigonal Tellurium by Atomic Hydrogen‐Removal of the Native Tellurium Oxide. Advanced Materials Interfaces (2021)

Christopher M. SmythGuanyu ZhouAdam T. BartonRobert M. WallaceChristopher L. Hinkle

materials scienceinterface sciencetrigonal telluriummechanical engineeringmaterials engineeringatomic hydrogen-removaladvanced materialsnative tellurium oxideapplied physics

1
2
3
4
5
45
10 / page

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