Faculty

Institution

Unit

Venue

John L. Freeouf

Professor

Portland State University

Affiliations

College of Liberal Arts and Sciences

Physics

John L. Freeouf is currently serving as a College Of Liberal Arts And Sciences Professor at Portland State University.

Honors

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Experiences

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Education

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John L. Freeouf

Portland State University

Professor

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materials science applied physics thin films physics semiconductors condensed matter physics solid-state electronics optoelectronics microelectronics electronics surface science electronic materials semiconductor technology semiconductor devices spectroscopy semiconductor materials vacuum device condensed matter interface science technology atomic physics compound semiconductors molecular beam epitaxy material research advanced dielectric aluminum gallium nitride oxide electronics electronic structure epitaxial growth electron spectroscopy schottky barriers gaas surfaces mechanical science composite science microwave technology synchrotron radiation crystal growth thin film processing pulsed laser deposition surface reactivity gaas buffer layers arsenic precipitates photoemission spectroscopy related compounds summary abstract spectroscopic ellipsometry atomic spectroscopy metals protein science raman spectroscopy spectroscopic property semiconductor device fabrication solid-state chemistry amorphous solid direct observation spectroscopic methods lattice theory surface characterization material analysis photoelectrochemistry thin film process technology printed electronics electrical properties semiconductor nanostructures physical layer surface treatments solid-state physics semi-insulating properties y2o3-stabilized hfo2 ellipsometer system dielectric functions low substrate temperatures ohmic contacts band gap layers valence-band structure

Notable Scholarly Works

Notable Federal Grants

Collaborators

Coaxial Tips for Infrared Nsom. (2011)

Michael HopkinsMoshood K. MorakinyoShankar RananavareAndres La RosaJohn L. Freeouf

materials sciencecoaxial tipsoptoelectronicsinfrared nsom

Extension of Far Uv Spectroscopic Ellipsometry Studies of High-κ Dielectric Films to 130 Nm. Thin Solid Films (2010)

Vimal K. KamineniJames N. HilfikerJohn L. FreeoufSteve ConsiglioRobert ClarkGert J. LeusinkAlain C. Diebold

high-k dielectric filmsmaterials scienceengineeringspectroscopy

Dielectric and Optical Properties of Epitaxial Rare-Earth Scandate Films and Their Crystallization Behavior. Applied Physics Letters (2006)

H. M. ChristenG. E. JellisonI. OhkuboS. HuangM. E. ReevesE. CicerrellaJ. L. FreeoufY. JiaD. G. Schlom

physicsthin filmsmaterials sciencecrystallization behaviorcrystallization temperatureelectronic materialsmaterial researchsemiconductor materialsmaterials engineeringoptical propertiessolid-state electronicssemiconductorspulsed laser depositionapplied physicscharacterization (materials science)advanced dielectricrare-earth scandatesepitaxial growthoptical materialscrystal growth

Growth and Properties of Epitaxial Rare-Earth Scandate Thin Films. Applied Physics A (2006)

T. HeegJ. SchubertC. BuchalE. CicerrellaJ.L. FreeoufW. TianY. JiaD.G. Schlom

thin filmsmaterials scienceepitaxial growthelectronic materialsmaterial researchmaterials engineeringsolid-state electronicscrystal growthsemiconductorsthin film process technologyapplied physicscharacterization (materials science)molecular beam epitaxy

Near Edge Xray Absorption Spectroscopy a Novel Approach for Determining Conduction Band Edge States in Transition Metal Oxide Gate Dielectrics. Physica Scripta (2005)

G. LucovskyY. ZhangJ. L. WhittenD. G. SchlomJ. L. Freeouf

materials scienceelectronic materialsadvanced dielectricsemiconductor materialsoxide electronicsquantum chemistrycondensed matter physicscondensed mattersolid-state electronicssemiconductorssolid-state physicsrare earthtransition metalapplied physicsquantum materialsband gap energiescharacterization (materials science)electronic structure

Optical Properties of La-Based High-K Dielectric Films. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2005)

E. CicerrellaJ. L. FreeoufL. F. EdgeD. G. SchlomT. HeegJ. SchubertS. A. Chambers

physicsthin filmsmaterials scienceband gapelectronic materialsadvanced dielectricoptical propertiesoxide electronicsoptical materialsnear-band gap absorptionthin film processingsemiconductorspulsed laser depositionapplied physicsoptoelectronicscharacterization (materials science)material analysis

Rare-Earth Scandate Single- and Multi-Layer Thin Films as Alternative Gate Oxides for Microelectronic Applications. Microelectronic engineering (2005)

T. HeegM. WagnerJ. SchubertCh. BuchalM. BoeseM. LuysbergE. CicerrellaJ.L. Freeouf

thin filmsmaterials sciencemicroelectronicsalternative gate oxidesmicroelectronic applicationsengineering

Measurement of the Band Offsets Between Amorphous Laalo3 and Silicon. Applied Physics Letters (2004)

L. F. EdgeD. G. SchlomS. A. ChambersE. CicerrellaJ. L. FreeoufB. HolländerJ. Schubert

thin filmsmaterials scienceband offsetselectronic materialssemiconductor materialsoxide electronicssolid-state electronicselectronicsthin film processingsemiconductorsvalence band offsetsamorphous laalo3 filmsapplied physicsamorphous solid

Spectroscopic Studies of Metal High‐ K Dielectrics: Transition Metal Oxides and Silicates, and Complex Rare Earth/Transition Metal Oxides. physica status solidi (b) (2004)

G. LucovskyJ. G. HongC. C. FultonY. ZouR. J. NemanichH. AdeD. G. ScholmJ. L. Freeouf

materials sciencetransition metal oxidesspectroscopic studiesspectroscopy

Dielectric Functions and Optical Bandgaps of High-K Dielectrics for Metal-Oxide-Semiconductor Field-Effect Transistors by Far Ultraviolet Spectroscopic Ellipsometry. Journal of Applied Physics (2002)

Seung-Gu LimStas KriventsovThomas N. JacksonJ. H. HaeniD. G. SchlomA. M. BalbashovR. UeckerP. ReicheJ. L. FreeoufG. Lucovsky

thin filmsmaterials sciencedielectric functionsoptoelectronicselectronic materialssemiconductor materialsoptical propertiesoxide electronicssolid-state electronicsy2o3-stabilized hfo2semiconductorsapplied physicscharacterization (materials science)advanced dielectricelectronicsspectroscopic propertyellipsometer systemoptical materialselectrical engineering

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John L. Freeouf

Professor

Portland State University

Affiliations

College of Liberal Arts and Sciences

Physics

John L. Freeouf is currently serving as a College Of Liberal Arts And Sciences Professor at Portland State University.

Honors

Create free account to unlock more features

Experiences

Create free account to unlock more features

Education

Create free account to unlock more features

John L. Freeouf

Portland State University

Professor

You can click a keyword to filter the displayed items

Notable Scholarly Works

Notable Federal Grants

Collaborators

Coaxial Tips for Infrared Nsom. (2011)

Michael HopkinsMoshood K. MorakinyoShankar RananavareAndres La RosaJohn L. Freeouf

materials sciencecoaxial tipsoptoelectronicsinfrared nsom

Extension of Far Uv Spectroscopic Ellipsometry Studies of High-κ Dielectric Films to 130 Nm. Thin Solid Films (2010)

Vimal K. KamineniJames N. HilfikerJohn L. FreeoufSteve ConsiglioRobert ClarkGert J. LeusinkAlain C. Diebold

high-k dielectric filmsmaterials scienceengineeringspectroscopy

Dielectric and Optical Properties of Epitaxial Rare-Earth Scandate Films and Their Crystallization Behavior. Applied Physics Letters (2006)

H. M. ChristenG. E. JellisonI. OhkuboS. HuangM. E. ReevesE. CicerrellaJ. L. FreeoufY. JiaD. G. Schlom

Growth and Properties of Epitaxial Rare-Earth Scandate Thin Films. Applied Physics A (2006)

T. HeegJ. SchubertC. BuchalE. CicerrellaJ.L. FreeoufW. TianY. JiaD.G. Schlom

Near Edge Xray Absorption Spectroscopy a Novel Approach for Determining Conduction Band Edge States in Transition Metal Oxide Gate Dielectrics. Physica Scripta (2005)

G. LucovskyY. ZhangJ. L. WhittenD. G. SchlomJ. L. Freeouf

Optical Properties of La-Based High-K Dielectric Films. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2005)

E. CicerrellaJ. L. FreeoufL. F. EdgeD. G. SchlomT. HeegJ. SchubertS. A. Chambers

Rare-Earth Scandate Single- and Multi-Layer Thin Films as Alternative Gate Oxides for Microelectronic Applications. Microelectronic engineering (2005)

T. HeegM. WagnerJ. SchubertCh. BuchalM. BoeseM. LuysbergE. CicerrellaJ.L. Freeouf

thin filmsmaterials sciencemicroelectronicsalternative gate oxidesmicroelectronic applicationsengineering

Measurement of the Band Offsets Between Amorphous Laalo3 and Silicon. Applied Physics Letters (2004)

L. F. EdgeD. G. SchlomS. A. ChambersE. CicerrellaJ. L. FreeoufB. HolländerJ. Schubert

Spectroscopic Studies of Metal High‐ K Dielectrics: Transition Metal Oxides and Silicates, and Complex Rare Earth/Transition Metal Oxides. physica status solidi (b) (2004)

G. LucovskyJ. G. HongC. C. FultonY. ZouR. J. NemanichH. AdeD. G. ScholmJ. L. Freeouf

materials sciencetransition metal oxidesspectroscopic studiesspectroscopy

Seung-Gu LimStas KriventsovThomas N. JacksonJ. H. HaeniD. G. SchlomA. M. BalbashovR. UeckerP. ReicheJ. L. FreeoufG. Lucovsky

1
2
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5
8
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